JPL Technical Report Server

The mask designs for Space Interferometer Mission (SIM)

Show simple item record

dc.contributor.author Wang, Xu
dc.date.accessioned 2014-12-10T00:43:10Z
dc.date.available 2014-12-10T00:43:10Z
dc.date.issued 2008-06-23
dc.identifier.citation SPIE Conference on Astronomical Instrumentation, Marseille, France, June 23 - 28, 2008 en_US
dc.identifier.clearanceno 08-2239
dc.identifier.uri http://hdl.handle.net/2014/44836
dc.description.abstract The Space Interferometer Mission (SIM) consists of three interferometers (science, guide1, and guide2) and two optical paths (metrology and starlight). The system requirements for each interferometer/optical path combination are different and sometimes work against each other. A diffraction model is developed to design and optimize various masks to simultaneously meet the system requirements of three interferometers. In this paper, the details of this diffraction model will be described first. Later, the mask design for each interferometer will be presented to demonstrate the system performance compliance. In the end, a tolerance sensitivity study on the geometrical dimension, shape, and the alignment of these masks will be discussed. en_US
dc.description.sponsorship NASA/JPL en_US
dc.language.iso en_US en_US
dc.publisher Pasadena, CA : Jet Propulsion Laboratory, National Aeronautics and Space Administration, 2008 en_US
dc.subject Diffraction en_US
dc.subject metrology en_US
dc.subject interferometry en_US
dc.title The mask designs for Space Interferometer Mission (SIM) en_US
dc.type Preprint en_US


Files in this item

This item appears in the following Collection(s)

Show simple item record

Search


Browse

My Account