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Electron-beam lithography for micro and nano-optical applications

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dc.contributor.author Wilson, Daniel W.
dc.contributor.author Muller, Richard E.
dc.contributor.author Echternach, Pierre M.
dc.date.accessioned 2006-07-27T17:29:55Z
dc.date.available 2006-07-27T17:29:55Z
dc.date.issued 2005-01-25
dc.identifier.citation SPIE Photonics West, Micromachining Technology for Microoptics and Nanooptics, San Jose, California, January 25-27, 2005. en
dc.identifier.clearanceno 04-3717
dc.identifier.uri http://hdl.handle.net/2014/39573
dc.description.abstract Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro- and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including some discussion regarding overcoming the problems of resist heating and charging. We also describe a multiple-field-size exposure scheme for suppression of field-stitch induced ghost diffraction orders produced by blazed diffraction gratings on non-flat substrates. en
dc.description.sponsorship NASA/JPL en
dc.format.extent 1072316 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US en
dc.publisher Pasadena, CA : Jet Propulsion Laboratory, National Aeronautics and Space Administration, 2005. en
dc.subject nanostructure fabrication en
dc.subject diffractive optics en
dc.subject electron-beam lithography en
dc.subject gratings en
dc.subject micro optics en
dc.title Electron-beam lithography for micro and nano-optical applications en
dc.type Preprint en


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