JPL Technical Report Server
Electron-beam fabrication of analog-relief diffractive optics of non-flat substrates at Jet Propulsion Laboratory
- JPL TRS Home
- →
- JPL Technical Report Server
- →
- JPL TRS 1992+
- →
- View Item
JavaScript is disabled for your browser. Some features of this site may not work without it.
| dc.contributor.author | Wilson, D. | en_US |
| dc.contributor.author | Maker, P. | en_US |
| dc.contributor.author | Muller, R. | en_US |
| dc.date.accessioned | 2004-09-17 | |
| dc.date.available | 2004-09-17 | |
| dc.date.issued | 2002-01-14 | en_US |
| dc.identifier.citation | NNUN Workshop: Electron Beam Lithography for Nanostructure Fabrication | en_US |
| dc.identifier.citation | Ithaca, NY, USA | en_US |
| dc.identifier.clearanceno | 02-0051 | en_US |
| dc.identifier.uri | http://hdl.handle.net/2014/8088 | |
| dc.format.extent | 5971013 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | en_US | |
| dc.subject.other | electron-beam lithography diffractive optics | en_US |
| dc.title | Electron-beam fabrication of analog-relief diffractive optics of non-flat substrates at Jet Propulsion Laboratory | en_US |
Files in this item
This item appears in the following Collection(s)
-
JPL TRS 1992+
JPL TRS 1992+