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Electron-beam fabrication of analog-relief diffractive optics of non-flat substrates at Jet Propulsion Laboratory

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dc.contributor.author Wilson, D. en_US
dc.contributor.author Maker, P. en_US
dc.contributor.author Muller, R. en_US
dc.date.accessioned 2004-09-17
dc.date.available 2004-09-17
dc.date.issued 2002-01-14 en_US
dc.identifier.citation NNUN Workshop: Electron Beam Lithography for Nanostructure Fabrication en_US
dc.identifier.citation Ithaca, NY, USA en_US
dc.identifier.clearanceno 02-0051 en_US
dc.identifier.uri http://hdl.handle.net/2014/8088
dc.format.extent 5971013 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other electron-beam lithography diffractive optics en_US
dc.title Electron-beam fabrication of analog-relief diffractive optics of non-flat substrates at Jet Propulsion Laboratory en_US


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