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High rated alumina nanotemplate fabrication on silicon wafer with controlled pore diameters
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| dc.contributor.author | Myung, N. V. | en_US |
| dc.contributor.author | Fluerial, J. P. | en_US |
| dc.contributor.author | Yun, M. | en_US |
| dc.contributor.author | West, W. | en_US |
| dc.contributor.author | Choi, D. | en_US |
| dc.date.accessioned | 2004-09-16T20:56:43Z | |
| dc.date.available | 2004-09-16T20:56:43Z | |
| dc.date.issued | 2003-08-03 | en_US |
| dc.identifier.citation | SPIE's 48th Annual Meeting | en_US |
| dc.identifier.citation | San Diego, CA, USA | en_US |
| dc.identifier.clearanceno | 03-0187 | en_US |
| dc.identifier.uri | http://hdl.handle.net/2014/6368 | |
| dc.format.extent | 1377061 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | en_US | |
| dc.subject.other | nano template alumina | en_US |
| dc.title | High rated alumina nanotemplate fabrication on silicon wafer with controlled pore diameters | en_US |
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JPL TRS 1992+
JPL TRS 1992+