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High rated alumina nanotemplate fabrication on silicon wafer with controlled pore diameters

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dc.contributor.author Myung, N. V. en_US
dc.contributor.author Fluerial, J. P. en_US
dc.contributor.author Yun, M. en_US
dc.contributor.author West, W. en_US
dc.contributor.author Choi, D. en_US
dc.date.accessioned 2004-09-16T20:56:43Z
dc.date.available 2004-09-16T20:56:43Z
dc.date.issued 2003-08-03 en_US
dc.identifier.citation SPIE's 48th Annual Meeting en_US
dc.identifier.citation San Diego, CA, USA en_US
dc.identifier.clearanceno 03-0187 en_US
dc.identifier.uri http://hdl.handle.net/2014/6368
dc.format.extent 1377061 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other nano template alumina en_US
dc.title High rated alumina nanotemplate fabrication on silicon wafer with controlled pore diameters en_US


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