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High contrast internal and external coronagraph masks produced by various techniques

Show simple item record Balasubramanian, Kunjithapatham Wilson, Daniel White, Victor Muller, Richard Dickie, Matthew Yee, Karl Ruiz, Ronald Shaklan, Stuart Cady, Eric Kern, Brian Belikov, Ruslan Guyon, Olivier Kasdin, N. Jeremy 2014-03-06T21:38:38Z 2014-03-06T21:38:38Z 2013-08-28
dc.identifier.citation SPIE Optics and Photonics, San Diego, California, August 25-29, 2013 en_US
dc.identifier.clearanceno CL#13-4088
dc.description.abstract Masks for high contrast internal and external coronagraphic imaging require a variety of masks depending on different architectures to suppress star light. Various fabrication technologies are required to address a wide range of needs including gradient amplitude transmission, tunable phase profiles, ultra-low reflectivity, precise small scale features, and low-chromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks, and lab-scale external occulter type masks by various techniques including electron beam, ion beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each. Further development is in progress to produce circular masks of various kinds for obscured aperture telescopes. en_US
dc.description.sponsorship NASA/JPL en_US
dc.language.iso en_US en_US
dc.publisher Pasadena, CA : Jet Propulsion Laboratory, National Aeronautics and Space Administration, 2013 en_US
dc.subject Exoplanet en_US
dc.subject occulter en_US
dc.subject PIAA en_US
dc.subject Shaped pupil en_US
dc.subject Modified Band Limited Coronagraph en_US
dc.subject Vector Vortex Coronagraph en_US
dc.subject Phase Induced Amplitude Apodization Complex Mask Coronagraph en_US
dc.title High contrast internal and external coronagraph masks produced by various techniques en_US
dc.type Preprint en_US

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