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Silicon nanotips antireflection surface for micro sun sensor

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dc.contributor.author Bae, Sam Y.
dc.contributor.author Lee, Choonsup
dc.contributor.author Mobasser, Sohrab
dc.contributor.author Manohara, Harish
dc.date.accessioned 2006-10-26T22:29:36Z
dc.date.available 2006-10-26T22:29:36Z
dc.date.issued 2006-07-17
dc.identifier.citation IEEE Nano Conference, Cincinnati, Ohio, July 17-20, 2006. en
dc.identifier.clearanceno 06-1448
dc.identifier.uri http://hdl.handle.net/2014/39867
dc.description.abstract We have developed a new technique to fabricate antireflection surface using silicon nano-tips for use on a micro sun sensor for Mars rovers. We have achieved randomly distributed nano-tips of radius spanning from 20 nm to 100 nm and aspect ratio of ~200 using a two-step dry etching process. The 30° specular reflectance at the target wavelength of 1 μm is only about 0.09 %, nearly three orders of magnitude lower than that of bare silicon, and the hemispherical reflectance is ~ 8%. By changing the density and aspect ratio of these nanotips, the change in reflectance is demonstrated. Using surfaces covered with these nano-tips, the critical problem of ghost images that are caused by multiple internal reflections in a micro sun sensor was solved. en
dc.description.sponsorship NASA/JPL en
dc.format.extent 4287550 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US en
dc.publisher Pasadena, CA : Jet Propulsion Laboratory, National Aeronautics and Space Administration, 2006. en
dc.subject antireflection en
dc.subject nano-tips en
dc.subject Mars en
dc.subject nanotechnolgoy en
dc.subject Micro Sun Sensor (MSS) en
dc.title Silicon nanotips antireflection surface for micro sun sensor en
dc.type Preprint en


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