JPL Technical Report Server

Proximity Effect Corrected Phase Holograms in PMMA

Proximity Effect Corrected Phase Holograms in PMMA

Maker, P.; Muller, R.
URI: http://hdl.handle.net/2014/34811
Date: 1993-06-01
Citation: EIPB-93
San Diego, California, USA

Abstract:

Computer generated phase holograms have been fabricated by E-Beam lithography in PMMA using patterned exposure and subsequent partial development.

Show full item record

Items in TRS are protected by copyright, but are furnished with U.S. government purpose use rights.

Files in this item

Thumbnail
Name: 93-0195.pdf
Size: 16.14Kb
Format: PDF
View/Open

This item appears in the following Collection(s)

Search


Browse

My Account