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Proximity Effect Corrected Phase Holograms in PMMA
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Proximity Effect Corrected Phase Holograms in PMMA
Maker, P.
;
Muller, R.
URI:
http://hdl.handle.net/2014/34811
Date:
1993-06-01
Citation:
EIPB-93
San Diego, California, USA
Abstract:
Computer generated phase holograms have been fabricated by E-Beam lithography in PMMA using patterned exposure and subsequent partial development.
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JPL TRS 1992+
JPL TRS 1992+
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