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Analog Phase Holograms by Electron Beam Lithography

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dc.contributor.author Maker, Paul D. en_US
dc.contributor.author Muller, Richard E. en_US
dc.date.accessioned 2004-10-05T05:19:05Z
dc.date.available 2004-10-05T05:19:05Z
dc.date.issued 1994-07-28 en_US
dc.identifier.citation San Diego, CA en_US
dc.identifier.clearanceno 94-1095 en_US
dc.identifier.uri http://hdl.handle.net/2014/33161
dc.description.abstract Phase holograms have been created on the surface of a thin film of poly-methyl methacrylate (PMMA, Plexiglas) by direct-write electron beam (E-Beam) lithography. The process involves delivering a patterned exposure dose followed by partial development with a strong developer. The patterned dose derives from arbitrary computer-calculated holograms, which must be corrected for the sensitivity characteristic of the PMMA and for the effective point-spread function of the E-Beam. en_US
dc.format.extent 785755 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other phase holograms computer generated phase holograms diffractive optics binary optics en_US
dc.title Analog Phase Holograms by Electron Beam Lithography en_US


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