JPL Technical Report Server

Thermal Runaway in High Purity Alumina

Thermal Runaway in High Purity Alumina

Jackson, H. W.; Barmatz, M.; Wagner, P.
URI: http://hdl.handle.net/2014/26150
Date: 1997-01-05
Citation: Lake Buena Vista, Florida, USA

Show full item record

Items in TRS are protected by copyright, but are furnished with U.S. government purpose use rights.

Files in this item

Thumbnail
Name: 96-1181.pdf
Size: 92.39Kb
Format: PDF
View/Open

This item appears in the following Collection(s)

Search


Browse

My Account