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Thick Film UV Lithography Fabrication of Large Area, Fine Pitch Collimating Grids for X-Ray Astronomy

Thick Film UV Lithography Fabrication of Large Area, Fine Pitch Collimating Grids for X-Ray Astronomy

Wiberg, D.; White, V.; Shcheglov, K.; Bonivert, W.; Hruby, J.; van Beek, F.; Dennis, B.; Hurford, G.; Lang, F.; Jackson, K.
URI: http://hdl.handle.net/2014/20548
Date: 1999-03-30
Citation: MTG: Microelectromechanicals Systems
Paris, France

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