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Taguchi Method Applied in Optimization of Shipley SJR 5740 Positive Resist Deposition

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dc.contributor.author Hui, A. en_US
dc.contributor.author Blosiu, J. O. en_US
dc.contributor.author Wiberg, D. V. en_US
dc.date.accessioned 2004-09-24T20:13:53Z
dc.date.available 2004-09-24T20:13:53Z
dc.date.issued 1998-02-23 en_US
dc.identifier.citation SPIE, International Society of Optical Engineering en_US
dc.identifier.citation Santa Clara, California, USA en_US
dc.identifier.clearanceno 98-0228 en_US
dc.identifier.uri http://hdl.handle.net/2014/19044
dc.description.abstract Taguchi Methods of Robust Design presents a way to optimize output process performance through an organized set of experiments by using orthogonal arrays. Analysis of variance and signal-to-noise ratio is used to evaluate the contribution of each of the process controllable parameters in the realization of the process optimization. In the photoresist deposition process, there are numerous controllable parameters that can affect the surface quality and thickness of the final photoresist layer. en_US
dc.format.extent 396735 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other Taguchi Method Shipley SJR 5740 orthogonal arrays Robust Design en_US
dc.title Taguchi Method Applied in Optimization of Shipley SJR 5740 Positive Resist Deposition en_US


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