JPL Technical Report Server

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit

Dowling, J.; Boto, A.; Abrams, D.; Williams, C.
URI: http://hdl.handle.net/2014/18881
Date: 1999
Citation: Physical Review Letters
N/A

Abstract:

Optical masking lithography has been the primary tool of the semiconductor industry for transferring circuit images onto substrates to form semiconductor chips.

Show full item record

Items in TRS are protected by copyright, but are furnished with U.S. government purpose use rights.

Files in this item

Thumbnail
Name: 99-2179.pdf
Size: 597.0Kb
Format: PDF
View/Open

This item appears in the following Collection(s)

Search


Browse

My Account