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Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit
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Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit
Dowling, J.
;
Boto, A.
;
Abrams, D.
;
Williams, C.
URI:
http://hdl.handle.net/2014/18881
Date:
1999
Citation:
Physical Review Letters
N/A
Abstract:
Optical masking lithography has been the primary tool of the semiconductor industry for transferring circuit images onto substrates to form semiconductor chips.
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JPL TRS 1992+
JPL TRS 1992+
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