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Stitching Error Reduction in Electron Beam Written Gratings

Show simple item record Dougherty, D. en_US Muller, R. en_US Maker, P. en_US Mansour, K. en_US Chacon, R. en_US Qiu, Y. en_US Young, M. en_US Forouhar, S. en_US 2004-09-24T19:14:29Z 2004-09-24T19:14:29Z 2000-05 en_US
dc.identifier.citation Conference on Lasers and Electro-Optics en_US
dc.identifier.citation USA en_US
dc.identifier.clearanceno 99-2143 en_US
dc.description.abstract A multiple-write electron beam lithography techniques is described as linear filter on the grating spatial frequency spectrum. en_US
dc.format.extent 143029 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other electron beam lithography gratings stitching error semiconductor lasers en_US
dc.title Stitching Error Reduction in Electron Beam Written Gratings en_US

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