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Stitching Error Reduction in Electron Beam Written Gratings

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dc.contributor.author Dougherty, D. en_US
dc.contributor.author Muller, R. en_US
dc.contributor.author Maker, P. en_US
dc.contributor.author Mansour, K. en_US
dc.contributor.author Chacon, R. en_US
dc.contributor.author Qiu, Y. en_US
dc.contributor.author Young, M. en_US
dc.contributor.author Forouhar, S. en_US
dc.date.accessioned 2004-09-24T19:14:29Z
dc.date.available 2004-09-24T19:14:29Z
dc.date.issued 2000-05 en_US
dc.identifier.citation Conference on Lasers and Electro-Optics en_US
dc.identifier.citation USA en_US
dc.identifier.clearanceno 99-2143 en_US
dc.identifier.uri http://hdl.handle.net/2014/18847
dc.description.abstract A multiple-write electron beam lithography techniques is described as linear filter on the grating spatial frequency spectrum. en_US
dc.format.extent 143029 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other electron beam lithography gratings stitching error semiconductor lasers en_US
dc.title Stitching Error Reduction in Electron Beam Written Gratings en_US


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