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A CMOS-compatible process technique for fabricating laterally embedded multi-nanaochannels without sacrificial etching

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dc.contributor.author Yang, E. en_US
dc.contributor.author Lee, C. en_US
dc.contributor.author Myung, N. en_US
dc.contributor.author George, T. en_US
dc.date.accessioned 2004-09-20T19:38:08Z
dc.date.available 2004-09-20T19:38:08Z
dc.date.issued 2003-06-08 en_US
dc.identifier.citation IEEE Transducers 03 en_US
dc.identifier.citation Boston, MA, USA en_US
dc.identifier.clearanceno 02-3029 en_US
dc.identifier.uri http://hdl.handle.net/2014/11093
dc.format.extent 2412402 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject.other vavle MEMS micropropulsion microspacecraft microthruster microfluids en_US
dc.title A CMOS-compatible process technique for fabricating laterally embedded multi-nanaochannels without sacrificial etching en_US


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